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云南大学材料科学与工程学院研究生导师王茺介绍如下:
王 茺
(Data Last updated Feb. 19, 2019)
理学博士,研究员,硕士生导师,云南省引进高层次人才,并入选云南省“万人计划青年拔尖人才”和“中青年学术技术带头人后备人才”培育计划。担任中国材料研究学会青年工作委员会理事,中国物理学会终身会员。
一直从事科研和教学工作。为本科生讲授《能源材料》、《工程力学》和《固体物理》等课程,曾为硕士研究生讲授《材料制备与合成》和《红外光电子材料》等课程。共主持包括国家自然科学基金、教育部重点、云南省应用基础面上项目在内的12个科研项目。迄今已发表SCI收录论文60余篇(其中以第一作者和通讯作者发表SCI收录论文43篇),共被引用870余次,H因子为15。共获得7项发明专利授权。
一、受教育经历:
1. 2004/03-2007/01,中国科学院上海技术物理研究所,红外物理国家重点实验室,博士(导师:陆卫)
2. 2001/09-2004/01,昆明理工大学,材料系,硕士(导师:张鹏翔)
3. 1997/09-2001/07,云南大学,物理系,学士
二、工作经历:
1. 2018/03至今,云南大学,材料科学与工程学院,教学科研
2. 2017/03-2018/03,美国休斯敦大学,电子工程系,访问学者
3. 2016/01-2017/06,云南大学,材料科学与工程学院,教学科研
4. 2007/07-2015/12,云南大学,工程技术研究院,教学科研
三、20篇代表性论文(*表示通讯作者,#表示共同一作)
[1] L.X. Ouyang#, C. Wang#,*, X.X. Feng, J. Yang, F. Qiu, R.F. Wang, Y. Yang, “Light emitting properties of Si+ self-ion implanted silicon-on-insulator from visible to infrared band”, Optics Express, 26(2018) 15899-15906.
[2] M. McDowell, A. Metzger, C. Wang, J.M. Bao, J.M. Tour, A.A. Marti, “Singular wavelength dependence on the sensitization of lanthanides by graphene quantum dots”, Chemical Communications, 54(2018) 4325-4328.
[3] Q.J. Shu, J. Yang, Q.B. Chi, T. Sun, C. Wang*, Y. Yang, “Microstructure and optical response optimization of Ge/Si quantum dots transformed from the sputtering-grown Ge thin film by manipulating the thermal annealing”, Nanotechnology, 29 (2018) 045602.
[4] J. Yang, M.L. Zhang, X. Lan, X.K. Weng1, R.F. Wang, F. Qiu, C. Wang*, Y. Yang, “Controllable Fabrication of Non-Close-Packed Colloidal Nanoparticle s by Ion Beam Etching”, Nanoscale Research Letters, 13 (2018)177.
[5] L. Tong, F. Qiu, T.J. Zeng, J. Long, J. Yang, R.F. Wang, J. Zhang, C. Wang*, T. Sun, Y. Yang*, “Recent progress in the preparation and application of quantum dots/graphene composite materials”, RSC Advances, 7 (2017)47999-48018.
[6] J. Yang, B. Zhao, C. Wang*, F. Qiu, R.F. Wang, Y. Yang, “Improving the growth of Ge/Si islands by modulating the spacing between screen and accelerator grids in ion beam sputtering deposition system”, Applied Surface Science, 386 (2016) 303-308.
[7] C. Wang*, S.Y. Ke, J. Yang, Y. Yang, “Review of quantum dot-in-a-well infrared photodetectors and prospect of new structures”, Journal Nanoscience and Nanotechnology, 16 (2016) 8046-8054.
[8] P. He, C. Wang*, C. Li, J. Yang, F. Qiu, R.F. Wang, Y. Yang, “Optical properties of the low-energy Ge-implanted and annealed SiO2 films”, Optical Materials, 46 (2015) 491-496.
[9] C. Wang*, S.Y. Ke, J. Yang, F. Qiu, R.F. Wang, Y. Yang, “Electronic properties of single Ge/Si quantum dot grown by ion beam sputtering deposition”, Nanotechnology, 26 (2015) 105201.
[10] C. Wang, Y. Yang, Z.F. Li, X.S. Chen, S.C. Shen, J.M. Liu, W. Lu, “Manipulation of quantum interference effects in La0.39Pr0.28Ca0.33MnO3-δ film by p-n junction at high temperature”, Journal of Applied Physics,103 (2008) 103705-103710.
[11] C. Wang, B. Zhang, C.S. Xia, T.X. Li, X.S. Chen, W. Lu, Q. Gong, “Optical transitions of surface InAs/GaAs (311B) quantum dots clearly identified by the piezoreflectance technique”, Applied Surface Science, 254 (2008) 4626-4631.
[12] C. Wang, Z.F. Li, X. M. Chen, J.M. Liu, H.Y. Cui, Y. Yang, W. Lu. “Study on carrier behavior in La0.9Ba0.1MnO3-δ/SrTiO3:Nb p-n heterojunction”, Thin Solid Films, 516 (2008) 4282-4287.
[13] C. Wang, P. P. Chen, N. Y. Tang, C. S. Xia, W. Lu. “Piezomodulated and photomodulated reflectivity study of strained InGaAs/GaAs single quantum well”. Phys. Lett. A, 350 (2006) 269-273.
[14] S.Y. Ke, J. Yang, F. Qiu, Z.Q. Wang, C. Wang∗, Yu Yang, “Secondary growth mechanism of SiGe islands deposited on a mixed-phase microcrystalline Si by ion beam co-sputtering”, Nanotechnology, 26 (2015) 445602.
[15] S.Y. Ke, S. Ye, J. Yang, Z.Q. Wang, C. Wang*, Yu Yang, “Morphological evolution of self-assembled SiGe islands based on a mixed-phase pre-SiGe island layer grown by ion beam sputtering deposition”, Applied Surface Science, 328 (2015) 387-394.
[16] Y. Yang*, J.M. Bao, C. Wang*, M.J. Aziz, “Sub-bandgap luminescence centers in silicon created by self-ion implantation and thermal annealing”, Journal of Applied Physics, 107(2010) 123109.
[17] Z. Zhang , R.F. Wang , J. Zhang , H.S. Li, J Zhang, F Qiu, J Yang , C. Wang*, Y Yang, “Direct growth of Ge quantum dots on the graphene/SiO2/Si structure by using ion beam sputtering deposition”, Nanotechnology, 27 (2016) 305601.
[18] J. Yang, B. Zhao, C. Wang*, F. Qiu, R.F. Wang, Y. Yang, “Improving the growth of Ge/Si islands by modulating the spacing between screen and accelerator grids in ion beam sputtering deposition system”, Applied Surface Science, 386 (2016) 303-308.
[19] Y. Yang, J.M. Bao, C. Wang*, M.J. Aziz, “Sub-bandgap luminescence centers in silicon created by self-ion implantation and thermal annealing”, Journal of Applied Physics, 107(2010) 123109.
[20] J. Chen, S.X. Wang, S. Zhang, X.J. Yang, Z.J. Huang, C. Wang, Q.Y. Wei, G.L. Zhang, J. Xiao, F.Z. Jiang, J. Chang, X. Xiang, J. Wang, “Arsenic pollution and its treatment in Yangzonghai lake in China: In situ remediation”, Ecotoxicology and Environmental Safety, 122(2015) 178-185.
四、研究方向
1. 全无机钙钛矿光电子材料与器件;
2. 稀磁掺杂量子点自旋电子材料;
3. 硅基量子点及其光电探测器件;
4. 硅基发光材料与器件。
五、科研相关荣誉
1. 2018年6月,云南省科学技术奖励(科技进步类),特等奖,排名第6;
2. 2018年6月,云南省科学技术奖励(自然科学类),一等奖,排名第2;
3. 2011年6月,云南省科学技术奖励(自然科学类),二等奖,排名第2;
4. 2004年6月,云南省科学技术奖励(自然科学类),二等奖,排名第8;
5. 2014年10月,云南省引进高层次人才,二等奖,独立奖;
6. 2006年12月,中国科学院大恒集团光学奖学金,特别奖,独立奖。
六、治学理念
志于道,据于德,依于仁,游于艺。
七、联系方式
通讯地址:昆明市呈贡大学城东外环南路,云南大学材料科学与工程学院;
邮政编码:650500;
电子邮箱:cwang@ynu.edu.cn 或者cwang6@163.com;
QQ号码:1311435496。
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